PIPS II System

Precision ion polishing system for precise centering, control, and reproducibility of your milling process.

Advantages Research Spotlight Media Library Publications Resources Back to top
  • X,Y stage permits alignment of argon beams to region of interest on the sample
  • Improved collimated beam provides useable voltages as low as 100 volts for rapid and damage free preparation of FIB lamella
  • Digital optical imaging with image storage and analysis in DigitalMicrograph® software
  • 10" color touch screen for display and control of all PIPS™ II parameters


Journal of Nuclear Materials

Aitkaliyeva, A.; Madden, J. W.; Miller, B. D.; Cole, J. I.; Gan, J.

Surface and Coatings Technology

Kumar, A.; Nayak, S. K.; Bijalwan, P.; Dutta, M.; Banerjee, A.; Laha, T.

Basic Solid State Physics

Olsen, V. S.; Bazioti, C.; Baldissera, G.; Azarov, A.; Prytz, Ø.; Persson, C.; Svensson, B. G.; Kuznetsov, A. Y.; Vines, L.

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