Solarus™ (Model 950) Advanced Plasma Cleaning System

SOLARUS - A totally NEW advanced plasma cleaning system for removal of hydrocarbon contamination on TEM and SEM samples. Solarus is a new generation plasma system engineered on new concepts and the latest technology resulting in better performance, simplified use and consistent cleaning results. It is radically different from any plasma system available in the market offering the most effective cleaning.

Simple and Easy Operation
Interactive touch screen offers continuous feedback including full-time diagnostics
Multi-Language Support
Si sample showing cleaning efficiency
Holey Carbon Film Sample contaminated with 1 drop of oil in 50 ml acetone
Lacey Carbon Hole (6 months old off the shelf)
Contaminated semiconductor sample showing scan window
After 10min H2/O2 cleaning all contamination removed with no apparent Si damage

SOLARUS offers clear differentiating features

1. Exclusive H2/O2 gas chemistry (Patent Pending). This unique chemistry provides superior cleaning with less sputter damage of all samples including holey carbon films and further enables samples to remain significantly cooler than if cleaned with the traditional Ar/O2 gas recipe.
2. Interactive touch screen interface offers seven pre-programmed recipes with optimized process parameters for greater consistency and repeatability.
3. Real-time RF auto-match and variable RF power supply (10W - 65W) ensure optimum plasma power and low loss under any cleaning conditions.
4. Mass flow controllers (MFC) provide accurate gas control for long term plasma stability and support up to three independent process gases H2, O2 and Ar.
5. Multi-functional chamber accepts two TEM holders through front ports while multiple SEM samples are loaded through the top opening lid.
6. Full-time turbo drag pumping system enables overall faster cycle times. Faster pump down - 50 seconds vs. the competitions' 3 minutes; Faster venting - 5 seconds vs. the competitions' 6 minutes.
7. Multi-language support includes operational instructions in English, German, French, Chinese, Korean, and Japanese.

The unique design of SOLARUS means better performance and higher productivity

1. Improved gentle cleaning, not sputtering;
2. Superior repeatability;
3. Greater flexibility of cleaning parameters for a greater range of material applications;
4. Faster cycle rates for higher sample throughput.

Benefits of plasma cleaning

• Enhanced imaging capability (Low Voltage)
• Improved accuracy when performing chemical microanalysis
• Longer viewing & acquisition times for EDX and EBSD
• Use of smaller probe size; a "must" for STEM and EELS analysis

Click here to contact your local Sales office