|
|
Gatan Answers 2
|

|
 |
Defect distribution and compositional variations in a light-emitting
material revealed by CL imaging and spectrum imaging |
|
David Stowe and Simon Galloway, Gatan UK
The increasing use of opto-electronic materials and devices is core technology
to our modern world. Emitting, amplifying and sensing devices enable high-speed
telecommunications whether through fibre optic, mobile or wireless. There are
also growing fields like optical data storage, energy efficient solid-state
lighting and photovoltaics. In order to develop and manufacture devices with
novel performance and suitable lifetimes, it is important to understand the
material science governing the opto-electrical behaviour. Included in this,
is an understanding of problems associated with scaling from laboratory prototypes
to high yield, large-scale manufacturing. Characterisation plays a pivotal role
at all stages in this process, especially when it comes to identifying the role
defects play in limiting the performance or lifetime. Thus, a technique which
enables spectroscopic characterisation of opto-electronic properties at high
spatial resolution is extremely powerful. Cathodoluminescence (CL) is such a
technique and Gatan’s MonoCL3 system remains at the forefront of this discipline.
CL is the emission of photons from a material when excited by an electron beam.
A wide range of materials, outside the obvious example of phosphors, give rise
to CL emissions. Indeed those materials used for opto-electronic devices are
ideal. The number and energy of photons emitted provide a wealth of information
about the material and the underlying physics. In compound semiconductors, the
CL will be a function of the band gap (associated with alloy composition and
crystal symmetry), dopants, impurities, line and point defects, stress, internal
electric fields, temperature, quantum confinement, and more! Such sensitivity
to material and experimental parameters (e.g. injection energy and density),
when coupled with the analytical environment of a scanning electron microscope
(SEM) or a transmission electron microscope (TEM), makes CL a potent and highly
flexible tool. Although a scanned image showing CL intensity can be informative,
especially with suitable resolution, the real wealth of information is often
only extracted by employing spectroscopic techniques at cryogenic temperatures.
Read on for a detailed look at how Gatan’s MonoCL3+™ and XiCLone™ system and
CF302 liquid-helium cooled SEM stage were applied to understand defect distributions
and alloy inhomogeneities in the commercially important and scientifically interesting
AlGaN system.
Case study: cathodoluminescence investigation of defects in crack free (Al,Ga)N
layers with low Al content.
All results shown are courtesy of Dr Uwe Jahn of the Paul Drude Institute
for Solid State Electronics, Berlin.
Nitride semiconductors have attracted widespread interest for more than a decade
for their extensive application potential. Aside from the extra-ordinary radiative
efficiency that can be achieved with novel growth techniques, much of their
potential, and indeed functionality in devices, comes from band-gap engineering
and doping. Alloying GaN with aluminium (AlGaN) or indium (InGaN) theoretically
allows the bandgap to be fine-tuned all the way from the UV to IR wavelengths.
On the quantum scale this enables confinement effects necessary, for example,
for room temperature laser operations, as used in blue laser digital storage
technology. Application areas for wide band gap AlGaInN semiconductors are diverse
and include solid-state lighting, radiation detectors / solar cells and as high
power / high-frequency electronic materials (e.g. 11 W/mm and 10 GHz respectively
already demonstrated).
Higher Al concentration pushes the emission wavelength to shorter wavelengths.
However, growing high quality epitaxial AlGaN, with good control over the electrical
conductivity and radiative efficiency, remains a significant challenge. Surface
cracking is a serious obstacle for AlGaN growth on traditional substrates, as
higher Al concentration leads to higher strain levels. Sophisticated buffer
layer engineering techniques are required to achieve bulk, crack-free, AlGaN
but the higher the Al content the more taxing the problem. Two important factors
in determining the quality of a semiconductor are the defect distribution and
compositional homogeneity. This requires the characterisation of a material’s
optical properties on the sub-micron scale.
A central tenant to Gatan’s MonoCL3 technology is achieving high spatial and
spectral resolution results. With SEM specimens, the resolution is primarily
dictated by the generation volume, with the spot size only becoming an important
factor once the kV is sufficiently low. Modern microscopes are capable of focusing
to a small spot size at low kV, but with a near surface generation volume, the
ratio of radiative emissions to surface losses becomes small. Excessive injection
density is often inappropriate as this perturbs the equilibrium conditions being
measured, and may cause beam induced changes to the specimen. In addition increasing
the beam current at the desired low kV, often leads to unwanted degradation
in the spot size, or charging problems. Hence, high spatial resolution injection
conditions are associated with a limited photon flux. All these factors emphasize
the necessity of optimum collection, dispersion and detection efficiency in
a CL system. MonoCL3 features direct optical coupling to detectors for serial
and parallel acquisition modes, and this enhances efficiency, whilst avoiding
chromatic losses. In this study, a short working distance CL collection mirror
was employed to optimise resolution at low kV.
Cryogenic cooling enhances CL at the expense of non-radiative recombination
losses and this can therefore enhance spatial resolution. Furthermore it can
minimize the injection levels required to stimulate certain processes, increase
spectral discrimination and allow unambiguous interpretation of the underlying
opto-electronic physics displayed locally by the specimen. However, high spatial
resolution work requires that the cooling stage does not introduce drift or
image vibration. Gatan’s CF302 continuous flow liquid helium cold stage is optimised
for these purposes and is ideally compatible with most SEMs as well as with
MonoCL3 for semiconductor applications.
The sample used in this study was a 2.5 microns thick AlxGax-1N(x
= 0.10) layer, grown by metal organic chemical vapor deposition on a sapphire
substrate with a thin GaN nucleation layer. The sample was crack free and investigated
in a field emission scanning electron microscope (FE SEM). A Gatan liquid-helium
cold stage and airlock (CF302 + C1010) was used and all results shown in this
report were obtained at a base temperature of 6K.
Figure 1 shows the plan view investigation of the sample. The secondary electron
image revealed a relatively smooth surface with some regions showing dark contrast,
these were assumed to be defect related. A spectrum recorded at 6 K displayed
two strong peaks centred at 3.665 and 3.520 eV. Several smaller peaks were also
observed between 3.6 and 3.64 eV. Monochromatic imaging at 3.553 and 3.674 eV
clearly showed a direct correlation between the defect distributions observed
in the secondary electron image and the lower energy peak. Several of these
regions are indicated in Figure 1. The defects are thought to be inversion domain
related, with lower Al concentrations. The monochromatic image at the higher
energy clearly showed regions of relatively uniform emission between the defects.
The energy of this luminescence closely corresponded to the bandgap of AlxGax-1N
(x = 0.1) at 6 K.

Figure 1 a) Plan view secondary electron image of the AlGaN
film, b) CL spectrum of AlGaN sample, c) monochromatic CL image at 3.533 eV
and d) monochromatic CL image at 3.674 eV. All results were recorded at 6 K.
The sample was cleaved and investigated in cross-section using panchromatic
imaging, monochromatic imaging and spectrum imaging. Figure 2 shows the secondary
electron image of the cross-section - the sapphire substrate, cleaved face and
the surface are clearly seen - and a panchromatic image acquired at 6 K. The
CL was observed to be non-uniform; some areas appeared bright, whilst dark,
vertical lines and dark regions in close proximity to the surface and to the
AlGaN/sapphire interface were also observed. Electron-hole pairs generated by
the electron beam are free to recombine via a number of mechanisms. CL is a
competitive process and any region which has a faster non-radiative recombination
rate than surrounding region appears dark. The darker areas are interpreted
as regions of higher dislocation density, near to interfaces where the increased
non radiative recombination reduces the CL intensity.

Figure 2 a) Secondary electron image and b) panchromatic CL image of
the cleaved AlGaN layer at 6 K. The arrows simply link the 2 images at 2 defined
points, whilst the dashed line indicates the position of the interface between
the substrate and the AlGaN layer.
Figure 3 shows a secondary electron image (a) and four monochromatic CL images
(b-e), recorded at 3.524, 3.542, 3.664 and 3.658 eV. The corresponding energies
are indicated on the spectrum in Figure 3f. The 4 monochromatic images showed
clear differences. The two images formed using the lower energy band-passes
showed vertical stripes. These largely ran from the substrate/AlGaN interface
to the surface, though some were located in the lower portion of the layer only
and terminated within the AlGaN layer itself. The two higher energy images showed
bright, horizontally striped regions which were periodically modulated.

Figure 3 a) Cross-sectional secondary electron image of the cleaved
face of the AlGaN on sapphire film. b) - e) monochromatic CL images at 3.524,
3.542, 3.664 and 3.658 eV respectively and f) CL spectrum of AlGaN sample, the
4 monochromatic energies are indicated by the arrows. All results were recorded
at 6 K.
The color mix facility included within Gatan’s DigitalMicrograph™ software
was used to combine the 4 monochromatic images and the secondary electron image.
The colors red, green, blue and yellow were assigned to the monochromatic energy
images in ascending energy order and the secondary electron image was kept as
a greyscale image, see Figure 4. In the color mixed image, the complex distribution
of the CL emission is shown. From this image, it was clear that those regions
with red and green coloring corresponded to defects which ran vertically though
the layer, whilst those regions with blue and yellow coloring were associated
with AlGaN luminescence from regions between defects. The fact that the luminescence
was observed to vary both laterally and vertically indicated a corresponding
fluctuation in the aluminium fraction of this compound semiconductor.

Figure 4 A color mixed image of monochromatic CL images at 3.524, 3.542,
3.664 and 3.658 eV and the secondary electron image of Figure 2a. The defects
are clearly observed as vertical stripes (green and red), whilst, in other areas
defect free AlGaN luminescence is observed (blue and yellow).
A more detailed and quantitative investigation of the AlGaN compositional fluctuation
was made using spectrum imaging linescan profiles, obtained using the XiClone
facility. In this mode, a line is selected by the user along which a number
of data points are acquired. At each data point along the line a full spectrum
is acquired, thus creating a multi-dimensional data set (wavelength, intensity
and position). For this sample, a total acquisition time of only a few seconds
was required to obtain the data presented below. The camera employed was LN2
cooled with 1340 x 100 pixels of 20 micron size, read at 16 bit depth and 2
MHz. This sensitivity and configuration helps with low injection conditions,
optimises the spectral resolution of the results, and increases the speed of
the experiment. (With XiCLone, spectrum imaging can be performed on areas as
well as line-scans, in which case dynamic drift correction can be employed to
enhance the integrity of results over extended acquisition periods.)
Spectrum imaging linescans can be acquired in just a few seconds and are a
powerful means of quickly quantifying the spatial variation in the spectral
signal at different depths in the cross section. In this example, 40 spectra
were recorded at 53 nm intervals in two positions as shown in Figure 5. In the
upper line profile (labelled 1), the high energy, bandgap related CL line dominated.
As the peak energy position reflects the Al content in the alloy, Gaussian fitting
tools can be used to map the Al concentration of the alloy along the linescan.
The results shown in Figure 6 indicate little fluctuation in the Al fraction
along the upper part of the cross section (0.120 – 0.124 = ~3%). In contrast,
the linescan closer to the interface, shown as linescan 2 in figure 5, shows
a completely different story. In place of relatively well defined peaks with
little variation in the peak energy positions, there are often multiple peaks
of different energy and varying intensity. The local distribution of Al content
in the alloy is very much more perturbed due to the higher defect concentration.
It is not possible to perform a similar fit of the peak energy position from
the linescan spectrum image because of the multiple nature of the CL peaks from
a given beam position. However, the complex nature of each spectrum suggests
variations in the Al concentration occur on a scale smaller than the resolution
of the probe.

Figure 5 Cross sectional secondary electron image of the cleaved sample,
with the regions investigated by spectrum imaging indicated by the lines labelled
1 and 2. The raw data from the 2 spectrum images is shown in the lower figure,
and is plotted as intensity (a.u.) as a function of energy (eV).

Figure 6 Aluminium fraction as a function of position along
the spectrum image linescan from the upper part of AlGaN layer, linescan 1.
Summary
The MonoCL3 family of products is ideally suited to providing
“the full picture” when investigating new opto-electronic materials and devices.
This note illustrates the wealth of information which can be achieved quickly
and with confidence, at the necessary spatial resolution when studying the important
AlGaInN system.
Further Reading
Correlation between optical and structural properties
of (Al,Ga)N layers grown by MOCVD
U. Jahn, D.-S. Jiang, K. H. Ploog, X. Wang, D. Zhao, and H. Yang
Physica Status Solidi (a) 204, No. 1, 294-298 (2007)
The effects of LT AlN buffer thickness on the optical properties of
AlGaN grown by MOCVD and Al composition inhomogeneity analysis
Wang, X. L., D. G. Zhao, U. Jahn, K. Ploog, D. S. Jiang, H. Yang, and J. W.
Liang
J. Phys. D 40, 1113–1117 (2007)
Cathodoluminescence spectroscopy and imaging of GaN/(Al,Ga)N nanocolumns
containing quantum disks
Jahn, U., J. Ristić, and E. Calleja,
Appl. Phys. Lett. 90, 161117, 3 pages (2007)
Growth, morphology, and structural properties of group-III-nitride nanocolumns
and Nanodisks.
Calleja, E., J. Ristić, S. Fernández-Garrido, L. Cerutti, M. A. Sánchez-Garcia,
J. Grandal, A. Trampert, U. Jahn, G. Sánchez, A. Griol, and B. Sánchez,
Phys. Status Solidi B 244, (2007) 2816–2837
Cathodoluminescence spectral mapping of selectively grown III-nitrides
structures
R W Martin, P R Edwards, C Lui, C J Deatcher, H M H Chong, R M de La Rue, and
I M Watson.
Inst. Phys. Conf. Ser. No 179, Section 2. (2003) 135-138
Advances in cathodoluminescence characterisation of compound semiconductors
using spectrum imaging
S A Galloway, P Miller, P Thomas and R Harmon,
Phys Stat Sol C, Vol 0, No 3, (2003) 1028-1032
Local probe techniques for luminescence studies of low-dimensional
semiconductor structures
A Gustafsson, M-E Pistol, L Montelius and L Samuelson,
J. Appl. Phys. Vol 84, No.4, (1998) 1715-1775
Direct evidence that dislocations are non-radiative recombination centers
in GaN
T Suguhara, H Sato, M Hao, Y Ndoi, S Kurai, S Tottori, K Yamashita, K Nishio,
L T Romano, and S Sakai.
Jpn. J. Appl. Phys, Vol 37 (1998) L.398-400
Challenging the spatial resolution limits of CL and EBIC
C E Norman. Proc BIAMs 2000, Solid State Phenom. Vols 78-79, (2000) 19-25,
Scitec Pub Ltd, eds Tomokage and Sekiguchi
Cathodoluminescence characteristics of InGaN/GaN quantum wells grown by MOCVD
Hwa-Mok Kim, Tae-Won Kang.
Materials Letters 48 (2001) 263-268
|