Model 682 PECS™

Precision Etching Coating System for SEM, TEM and LM

The ideal instrument for any application requiring slope cutting, sample etching and/or high-resolution sputter coating. The PECS™ is a unique ion beam based etching and sputter coating system producing exceptionally large, clean, viewable areas of specimens for Scanning Electron Microscope (SEM), Transmission Electron Microscope (TEM) and Light Microscope (LM) applications. The unique design features incorporated into the PECS™ make it very versatile. Add to this the Model 682.40000 Slope cutter, a unique tool for exposing cross sections.

Alternative or supplement to wet chemical etching

Controlled repeatable results (Ion gun voltage, ion beam current and etching time)

Etching and coating in the same vacuum chamber reduces sample handling

Sample coating immediately after etching eliminates sample contamination

Includes a Film Thickness Monitor for accurate control of film thickness

High sample throughput, patented Whisperlok™ for fast and simple specimen exchange

Whisperlok™ features both sample rotation and rocking to ensure uniform etching and coating

Reactive Ion Beam Etching (RIBE System)

No wet chemical handling or disposal hazards

PECS Application note

In general it’s not possible to reveal the structure of all phases in a Heterogeneous material simultaneously by conventional chemical etching methods if the components differ in their chemical properties. Ion Beam Etching Techniques however work quite well in many of these cases. One of the more important applications for this method in metallography is etching of metal combinations with extreme difference in chemical potential. Our examples show several Heterogeneous materials from various manufacturing processes that were prepared by ion beam etching. Application examples include build-up welds made out of Nickel containing weld material on plain steel or GGG40, welds with a Ni interface layer, and corrosion or wear protection layers produced by powder metallurgical processes. The differences in chemical composition between substrate and surface layer are demonstrated by corresponding Electron Microprobe profiles (See Graf poster).

Test Procedure and Results
The ion beam etching was performed with the PECS (Precision Etching and Coating System). The broad beam ion source in this system generates a 10mm beam diameter at vertical incidence to the sample, depending on the ion gun parameters (ion gun voltage and ion beam current). By tilting the specimen, i.e. altering the incident angle, and rotating the specimen during the process
the etching diameter can be further enlarged. Although the chemical compositions of the metals that build up the composites are very different, ion beam etching reveals the structure of all compounds equally and simultaneously. DIC (Differential Interference Contrast) can be used to enhance the characteristic contrast that stems from the etching due to ion bombardment. Sputtering yields of the individual compounds play an important role in optimizing ion beam etching of composite materials. Although the chemical characteristics of surface layer and substrate reveal enormous differences the sputtering yields are similar.

Click here for a copy of Ion Beam Etching of Metal Composites using Gatan's PECS (I.Gräf)

Optional Slope Cutter

Model 682.40000 Slope Cutter Tool (SC-Tool) – It offers cross sectional cutting of homogeneous/heterogeneous materials while minimizing mechanical deformation or damage.

Now Available SEM Techniques Using the Gatan Precision Etching and Coating System (PECS™) is a 32-page booklet of beautiful images acquired with the Gatan PECS and 'recipes' for how to achieve the best results using the PECS. Topics include Cleaning, Coating, Etching, Metallographics, EBSD, DIE Packages, and Sputtering Rate Charts for C, Cr, Pt and AuPd. A must-have for any materials scientist. Click here and we'll send you one!

Specifications