Fast joint EELS / EDS color map across a 32 nm transistor device
Paolo Longo, Ph.D., Gatan, Inc. Sample courtesy of Dr. Pavel Potapov at Global Foundries, Dresden, Germany Microscope courtesy of Dr. P. Rice and Dr. T. Topuria at IBM (Almaden), San Jose, CA Acknowledgements to Dr. P. Rice and Dr. T. Topuria at IBM (Almaden), San Jose, CA for helping set up microscope for experiment.

32 nm Transistor device

Methods

probe-corrected Jeol ARM 200 TEM/STEM microscope
C-FEG emission gun
GIF Quantum® ER system
Jeol Centurio SDD EDS detector (0.98 sr)
O K at 532 eV (red); Ti L at 456 eV (green); Ni L at 855 eV (light blue); N K at 401 eV (yellow); Hf M at 1662 eV (purple)
voltage: 200 kV
data taken in STEM mode
EELS core-loss spectrum (300 – 2300 eV): 1.5 ms
EDS spectrum (0 – 20 keV): 1.5 ms
d
ataset size: 256 x 256 pixels
t
otal exposure time: just over 2 min