Model 683 Met-Etch

Preparation of Metallographic Materials by Ion Beam Etching

The Met-Etch offers an ion beam etching-only alternative to the multi-functional PECS™ system. It is a cost effective, affordable, next-generation apparatus for the preparation of metallographic samples that do not require sputter coating. Typical applications include Scanning Electron Microscopy (SEM or high resolution FESEM) and Light Microscopy (LM). Quality samples are produced in a clean environment, under a controlled process with reproducible results. The ion beam etching technique used avoids the hazards and costs associated with wet chemical etching. The Met-Etch offers numerous unique features including the optional Model 682.40000 Slope cutter, a unique tool for exposing cross sections.

Alternative or supplement to wet chemical etching

Simple and easy to use with controlled repeatable results

Reduced sample handling

No sample contamination

High sample throughput, Whisperlok™ for fast and simple specimen exchange

Whisperlok features both sample rotation and rocking to ensure uniform etching and coating

Low cost of ownership

Reactive Ion Beam Etching (RIBE) System

No wet chemical handling or disposal hazards

Optional Slope Cutter

Model 682.40000 Slope Cutter Tool (SC-Tool) – It allows cross sectional cutting of homogeneous/heterogeneous materials while minimizing mechanical deformation or damage.

Specifications