Australian Capital Territory Research at the Australian National Fabrication Facility

Lab focus

"To offer a state-of-the-art facility and processing capabilities open to all scientists and researchers in Australia and overseas to help realise outstanding research in materials and/or devices requiring sub-micrometre feature size for applications in, though not restricted to, photonics/opto-electronics."


The ANFF ACT is located at the Australian National University. Their facilities are based on photonic/electronic materials growth, processing and fabrication of devices including micro electro mechanical systems (MEMS). These facilities provide a range of capabilities and services for the micro/nanofabrication of photonic and related devices as well as the fabrication of waveguides and photonic crystals.

Inside RF/DC sputter coater, ANUOptoelectronic devices such as semiconductor lasers, photodetectors and modulators are widely used for communications, data storage, and medical applications. Further, photonic crystals, with their ability to confine light and guide and control its propagation, promise an entire suite of ultra-compact optical devices analogous to those of semiconductor electronics. Hence the node is internationally recognized for supporting both state-of-the-art research and proof-of-concept development for the industry.

ANFF-ACT also enjoys access to two well-known ANU research groups at the Laser Physics Centre and the Department of Electronic Materials Engineering. These groups bring expertise in the capabilities of high energy ion implantation, Si-etching, optical characterisation, and two metal organic chemical vapor deposition (MOCVD) reactors for the growth of III-V compound semiconductor multi- layers based on GaAs, AIGaAs, InGaAs, InP, InGaAsP, InAlGaAs, GaSb, InSb, and InGaAsN. These reactors enable the fabrication nanowires, quantum dots, quantum wells, strained layers, and devices.

Specialist fields:

  • micro/nano fabrication of photonic and related devices
  • fabrication of waveguides and photonic crystals
  • Micro-electro-mechanical-systems MEMS

Flagship facilities:

  • Raith 150 electron beam lithography system for nanostructure fabrication
  • RF /DC sputtering system for metal and dielectric multi-layer deposition
  • Cluster tool for dry etching and deposition
  • Dual beam focused ion beam
  • Nano imprint lithography

Please visit the lab's website for more information.