Model 681 High Resolution Ion Beam Coater
High Resolution Ion Beam Coating System for SEM and TEM
A unique ion beam based sputter coating system producing continuous, ultra thin, amorphous coatings free of thermal artifacts making them ideal for FESEM and TEM applications. This is an important advantage over traditional coating techniques such as thermal evaporation, magnetron or RF sputtering that produces coarse deposition structures.
Two Compact Ion Sources produce high sputtering rates. Coating times vary from about 10 seconds to 2 minutes depending on target material, ion beam energy and coating thickness.
A Whisperlok™ mechanism provides true "Fast Specimen Exchange"
(<1 minute) thus eliminating venting the complete chamber to atmosphere when loading and unloading samples. A second key feature is providing variable speed sample rotation along with simultaneous rocking to ensure uniform sample coating.
TEM Whisperlok™ Adapters (Optional) offers the ability to accept all makes of side-entry TEM or SEM sample holders. Samples may be coated at low temperatures using TEM cryoholders if required.
Multiple Targets: The target exchange mechanisms permits selection of one of two available target materials within seconds without breaking vacuum. Adding a second target exchange mechanism (Optional) allows the user two additional targets for a total of four target materials. Dormant targets within the chamber are fully shielded from sputter contamination.
The Gatan ion beam coater offers convenience, efficiency and dependability in a compact, bench-top instrument. It produces ultra-fine grained/amorphous and artifact free coatings for the more demanding high-resolution field-emission microscopes. Specimens are coated quickly with negligible specimen heating.
An optional Film-Thickness Monitor (FTM) measures deposition rate continuously and permits improved control of the film thickness.
|Ion Guns||Two Penning ion guns with miniature rare earth magnets|
|Ion Beam Energy||1.0keV to 10.0keV|
|Beam Diameter||About 1mm FWHM|
|Ion Current Density||10mA/cm2 Peak|
|Gas throughput||Argon at 0.1cc/minute/gun|
|Sample Holder||Accepts 1¼ inch (31mm) Metallographic mounts and multiple SEM stubs|
|Sample Rotation||Variable speed 10-60rpm|
|Sample Tilt||Fixed angle or variable rocking angle (0° - 90°)|
|Sample Rocking||Variable speed 5°/Sec - 36°/sec|
|Option||TEM adapters for side-entry TEM or SEM holders|
|Coating Rate||Approximately 0.5 Å/sec for Carbon and 1.5 Å /sec for Chromium at 10.0keV|
|Coating Area||Uniform over a 1 inch diameter|
|Target Holder||One dual target set, externally selectable while under vacuum|
|Target Materials||Choice of four target materials (see complete list)|
|Dry Pumping System||Two stage diaphragm pump backing a 60l/sec molecular drag pump|
|Vacuum Gauge||Cold-cathode gauge for specimen chamber. Solid state sensor for backing pressure|
|Specimen Exchange||Gatan Patented Whisperlok™, specimen exchange time <1 minute|
|Liquid-nitrogen Trap||Approximately 5 hour capacity (Standard)|
|Dimension and Utilities|
|Overall Size||560mmW x 480mmD x 430mmH (22"W x 19"D x 17"H)|
|Shipping Weight||45kg (100lbs)|
|Power Requirements||Universal voltage 100VAC - 240VAC, 50/60Hz
User to specify voltage to insure correct line cord
|Power Consumption||200 Watts during operation, 100Watts with ion guns off|
|Gas Requirements||Argon gas at 70psi (4.82 bar)|