PIPS II System

Precision ion polishing system for precise centering, control, and reproducibility of your milling process.

Advantages Research Spotlight Media Library Publications Resources Back to top
Advantages: 
  • X,Y stage permits alignment of argon beams to region of interest on the sample
  • Improved collimated beam provides useable voltages as low as 100 volts for rapid and damage free preparation of FIB lamella
  • Digital optical imaging with image storage and analysis in DigitalMicrograph® software
  • 10" color touch screen for display and control of all PIPS™ II parameters

Publications

Journal of Nuclear Materials
2015

Aitkaliyeva, A.; Madden, J. W.; Miller, B. D.; Cole, J. I.; Gan, J.

ECS Journal of Solid State Science and Technology
2019

Adikimenakis, A.; Chatzopoulou, P.; Dimitrakopulos, G. P.; Kehagias, Th.; Tsagaraki, K.; Androulidaki, M.; Doundoulakis, G.; Kuzmik, J.; Georgakilas, A.

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