PIPS II System

Precision ion polishing system for precise centering, control, and reproducibility of your milling process.

Advantages Research Spotlight Media Library Publications Resources Back to top
  • X,Y stage permits alignment of argon beams to region of interest on the sample
  • Improved collimated beam provides useable voltages as low as 100 volts for rapid and damage free preparation of FIB lamella
  • Digital optical imaging with image storage and analysis in DigitalMicrograph® software
  • 10" color touch screen for display and control of all PIPS™ II parameters


Journal of Nuclear Materials

Aitkaliyeva, A.; Madden, J. W.; Miller, B. D.; Cole, J. I.; Gan, J.


Bansen, R.; Ehlers, C.; Teubner, T.; Markurt, T.; Schmidtbauer, J.; Boeck, T.

Journal of Physics D: Applied Physics

Wegele, T.; Beyer, A.; Ludewig, P.; Rosenow, P.; Duschek, L.; Jandieri, K.; Tonner, R.; Stolz, W.; Volz, K.

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