Application Note
Argon ion polishing of focused ion beam specimens in PIPS II system
November 6, 2015
PIPS II System
Model 695
Precision ion polishing system for precise centering, control, and reproducibility of your milling process.
Advantages
This revolutionary enhancement of the PIPS™ ion mill that has defined the standard for transmission electron microscope (TEM) sample preparation for over 20 years.
X,Y stage permits alignment of argon beams to region of interest on the sample
Improved collimated beam provides useable voltages as low as 100 volts for rapid and damage free preparation of FIB lamella
Digital optical imaging with image storage and analysis in DigitalMicrograph® software
10" color touch screen for display and control of all PIPS II parameters
Datasheet
Applications
Unlock the power of electron microscopy with Gatan—explore cutting-edge applications, dive into expert-led webinars, and discover insights through detailed application notes that fuel scientific breakthroughs.
Article
Ready, set, go! Ensuring an identical TEM specimen preparation route again and again
October 29, 2015
Article
Application of PIPS II system for cross-sectional TEM specimen preparation of semiconductor devices
September 30, 2015
Media Gallery
Immerse yourself in the world of scientific discovery—explore striking microscopy images that reveal the unseen, alongside videos and tutorials showcasing Gatan technology in action.
Atomic level EELS prepared in PIPS II system following FIB preparation (image 2)
Atomic level EELS prepared in PIPS II system following FIB preparation
AlPb melt-spun ribbon with 1 - 3% at wt Ga HR-STEM using TEAM 0.5
Ca3Co4O9 on SrTiO3 substrate
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