PIPS II System

Precision ion polishing system for precise centering, control, and reproducibility of your milling process.

Advantages Research Spotlight Media Library Publications Resources Back to top
  • X,Y stage permits alignment of argon beams to region of interest on the sample
  • Improved collimated beam provides useable voltages as low as 100 volts for rapid and damage free preparation of FIB lamella
  • Digital optical imaging with image storage and analysis in DigitalMicrograph® software
  • 10" color touch screen for display and control of all PIPS™ II parameters


Journal of Nuclear Materials

Aitkaliyeva, A.; Madden, J. W.; Miller, B. D.; Cole, J. I.; Gan, J.

Nature Communications

Wu, S.; Kou, Z.; Lai, Q.; Lan, S.; Katnagallu, S. S.; Hahn, H.; Taheriniya, S.; Wilde, G.; Gleiter, H.; Feng, T.

Nature Communications

Xiao, B.; Luan, J.; Zhao, S.; Zhang, L.; Chen, S.; Zhao, Y.; Xu, L.; Liu, C. T.; Kai, J. -J.; Yang, T.

Back to top